From the last several lithography nodes, in the 14 to 10nm range, to the latest nodes, in the 7 to 5nm range, the requirements for patterning and image transfer materials have increased dramatically.
In a new review article publication from Opto-Electronic Advances, Yingtao Hu, Di Liang and, Raymond G. Beausoleil from Hewlett Packard Labs discuss advanced III-V-on-silicon photonic integration.
The Thermo Scientific™ SampleManager™ LIMS Software version 21.3 is designed to enhance laboratory workflows, data management, and overall efficiency. Key features and improvements include: 1.
The competitiveness capacity of a business enterprise in the smartphone industry is determined by the scope of its influence in the value chain. An industry value chain is the cumulative series of ...
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