Researchers at MIT’s Research Laboratory of Electronics (RLE) present a way to get the resolution of high-speed e-beam lithography down to just nine nanometers. Combined with other emerging ...

Jena, Germany -- Jenoptik invests in a new electron-beam (E-Beam) lithography tool, which will go into operation at its Dresden, Germany site in mid-2022. The new E-Beam system will be built by the ...

E-beam lithography operates on principles similar to photolithography but provides significantly higher resolution. The process begins with coating a substrate with an electron-sensitive resist ...

BLOOMINGTON, Minn. & SANTA CLARA, Calif.--(BUSINESS WIRE)--SkyWater Technology (NASDAQ: SKYT) announced today that it has received from Multibeam Corp., a first-of-a-kind Multicolumn E-Beam ...

SANTA CLARA, Calif. – During the SPIE Microlithography conference here, IBM Corp. and Nikon Corp. announced demonstration of a “real” wafer exposure tool, based on electron-beam projection lithography ...

Over the past few years we’ve seen several impressive projects where people try to manufacture integrated circuits using hobbyist tools. One of the most complex parts of this process is lithography: ...

LONDON — The eBeam Initiative, a forum for the promotion of chip manufacturing using e-beam lithography, has said that two of its leading members Direct2Silicon Inc. (San Jose, Calif.) and Advantest ...

The minimum time to expose a given area for a given dose is given by the following formula: Dose * exposed area = beam current * exposure time/ step size **2 = total charge of incident electrons For ...

TOKYO--(BUSINESS WIRE)--Advantest Corporation (TSE: 6857, NYSE: ATE) May 19, 2015 - Leading semiconductor equipment supplier Advantest Corporation announces that imec has selected its leading-edge ...

The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...

The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...