Photomasks are becoming more complex at each node. In fact, masks are moving from traditional shapes to non-orthogonal patterns and complex shapes, such as curvilinear mask patterns. To measure ...

TOKYO, Sept. 09, 2025 (GLOBE NEWSWIRE) -- Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) today announced the release of its next-generation CD-SEM* E3660, engineered ...

For years the IC industry has worried about a bevy of issues with the photomask. Mask costs are the top concern, but mask complexity, write times and defect inspection are the other key issues for ...

Katie covered all things how-to at CNET, with a focus on Social Security and notable events. When she's not writing, she enjoys playing in golf scrambles, practicing yoga and spending time on the lake ...