In this interview, Mark Bumiller, Technology Manager for Entegris talks to AZoM about using the Accusizer to detect large particles counts in CMP slurries. Please could you give us an introduction to ...

Carbon slurries, which consist of a suspension of carbon particles in a solvent, are used to mass-produce battery electrodes. However, there are no adequate methods to evaluate whether the particles ...

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Rheology plays a pivotal role in mineral processing by providing insights into the flow and deformation characteristics of complex slurries, which in turn affect flotation performance. The interplay ...

In semiconductor manufacturing, a process called chemical mechanical planarization (CMP) is used for polishing wafer surfaces. CMP uses a slurry that contains both functional chemicals and ...

CRANBURY, N.J.--(BUSINESS WIRE)--Jan. 11, 2006--Specialty chemical producer Rhodia Inc. (NYSE:RHA) has launched a line of guar slurries to improve the productivity of oil and natural gas drilling ...

German chemical giants BASF and Evonik Industries have agreed to collaborate on the development of ceria-based chemical mechanical planarization (CMP) slurries for fabricating computer chips. The ...

Japanese conglomerate Fujifilm has opened a new facility for the production of Chemical Mechanical Polishing (CMP) slurries, a basic material used in semiconductor manufacturing process. CMP slurries ...

Hose pumps can circulate slurry SGs of 1.6 to 1.8 or up to 80% solid content. The traditional centrifugal pump loses efficiency when the slurry SG reaches 1.3 or 30% solids. With this limitation, ...

In any industrial process that relies on solid-liquid separation, the filter press remains one of the most reliable and widely used pieces of equipment. It delivers consistent dewatering, reduces ...