† Catalysis Division, National Institute of Technology, Av. Venezuela 82, Rio de Janeiro, RJ 20081-312, Brazil ‡ Chemical Engineering Department, Military Institute of Engineering, Praça Gal. Tiburcio ...

Department of Chemical and Biochemical Engineering, National Engineering Laboratory for Green Productions of Alcohols-Ethers-Esters, College of Chemistry and Chemical Engineering, Xiamen University, ...

Abstract: In this study, we investigate the deposition of high-k dielectric materials, namely Al2O3 and HfO2, using atomic layer deposition for 4H-SiC metal-oxide-semiconductor applications. C-V ...

Abstract: An antireflection coating (ARC) for silicon devices operating at 10 μm has been designed, fabricated and validated. The ARC is based on ZnS and Al2O3 and is deposited at room temperature.

LUOYANG, China, Feb. 09, 2026 (GLOBE NEWSWIRE) -- TRUNNANO, a leading global supplier of industrial ceramic materials, recently announced a significant breakthrough in the research, development, and ...