Heidelberg, Germany – Heidelberg Instruments has made significant performance upgrades to its renowned DWL 66 + direct-write lithography system, solidifying its position as the ultimate research tool ...

Multilayer optics is a field that exploits the interference of X-rays or extreme ultraviolet radiation reflected off precisely engineered nanoscale layers. By depositing alternating thin films of ...

A panel representing all aspects of the lithographic ecosystem talked about the future of EUV lithography on February 28th, during the SPIE Advanced Lithography + Patterning conference, in San Jose, ...

Fig. 1 | Metalens-based DLW lithography. Schematic diagrams of (a) the DLW lithography setup, (b) the metalens and its constructing unit cells. (c) The metalens in top view and cross-section view. (d) ...

Multiphoton lithography (often called multiphoton 3D lithography) is an additive manufacturing approach for fabricating intricate micro- and nanostructures. It relies on nonlinear optical absorption, ...

The Fraunhofer Institute for Applied Optics and Precision Engineering IOF inaugurated its newest research building today with a ceremony. In addition to Federal Research Minister Dorothee Bär, ...

Micro optics can replace bulky traditional optics with sleek, micro and nanostructured alternatives, enabling more advanced optical functions. These components, produced with semiconductor ...

Bye-bye lens, hello metasurface. So-called metasurfaces can help to make optical systems thinner in the future, while at the same time increasing their functionality. "After 500 years of lenses and ...

A recent article in Advanced Materials reports a new fabrication method for nonlinear optical components using nanostructured polycrystalline lithium niobate (LN). The study addresses key limitations ...