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超高分辨无掩模直写光刻机
Microtech是1982年美国MIT林肯国家实验室高科技孵化企业, 也是全球最早商业化激光直写光刻系统品牌之一, 现阶段其主打LW405系列德国SUSS参与合作, 且已发展细分为科研级, 产业级, 半导体千束级, 可适用于研发, 小规模量产, 以及大规模产业化, 除了高性能外, 其可靠性和多功能性也得到业界的一致认可和 ...
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